Control of solid state dimensional features

摘要

A solid state structure having a surface is provided and is exposed to a flux, F, of incident ions. The conditions of this incident ion exposure are selected based on: 1 $\frac{\partial }{\partial t}C\left(r,t\right)=F{Y}_1+D{\nabla }^{2}C-\frac{C}{{\mathrm{tau}}_{\mathrm{trap}}}-FC{\mathrm{sigma}}_C,$ where C is concentration of mobile adatoms at structure surface, r is vector surface position, t is time, Y1 is number of adatoms created per incident ion, D is adatom diffusivity, tautrap is average lifetime of an adatom before adatom annihilation occurs at a structure surface defect characteristic of solid state structure material, and sigmaCis cross-section for adatom annihilation by incident ions characteristic of selected ion exposure conditions. Ion exposure condition selection controls sputtering of the structure surface by incident ions to transport, within the structure including the structure surface, material of the structure to a feature location, in response to the ion flux exposure, to produce a feature substantially by locally adding material of the structure to the feature location.