| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a three-dimensional structure, which forms a three-dimensional periodic structure having a high optical confinement effect and a high accuracy at a low cost. SOLUTION: A thin film layer made of a single crystal silicon or a silicon germanium is formed on a substrate 31 made of silicon with a porous layer 32 made of a porous silicon between them. The thin film layer is patterned by a two-dimensional periodic pattern consisting of many prisms of the same shape to form a thin film pattern layer 12. After the thin film pattern layer 12 is welded to a support substrate 11, the substrate 31 is peeled with a separation layer 32A of the porous layer 32 as the boundary. In the same manner, a thin film pattern layer 13 is formed on another substrate and is laminated by welding so that prisms of the thin film pattern layer 13 orthogonally cross those of the thin film pattern layer 12. Hereafter, thin film pattern layers 14 to 21 are formed and laminated in the same manner to obtain a three- dimensional structure body 10. |
