| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a photomask having sheet film such as a Cr layer as a light shielding layer, for preventing reflection of light when the photomask is used, for enabling exposure with high resolution and by which occurrence of a void defect such as a pin hole due to cleaning, etc., is suppressed. SOLUTION: The photomask having the light shielding layer including at least one kind of metals and metal oxide on the surface of a transparent substrate, is characterized by having a protection layer on the light shielding layer. The protection layer has a film thickness equal to or less than 5μm, and reflection ratio of short wavelength light with a wavelength equal to or less than 440 nm (especially below 405 nm) is equal to or less than 35%.</p> |
