| 摘要 |
PROBLEM TO BE SOLVED: To provide a vaporizing and feeding method for vaporizing and feeding a liquid CVD raw material, under the atmosphere pressure, to a semiconductor manufacturing apparatus at a desired concentration and flow rate without degrading its quality. SOLUTION: The liquid CVD raw material is introduced, together with a heated carrier gas, into a vaporizer having a vaporization chamber shaped to a spherical, elliptic-spherical, barrel, cylindrical, conical, frustoconical, hemispherical or their resembling shape or the shape combining these shapes with a vertical line as axis and is vaporized while the inside of the vaporizer is kept under the absolute pressure of 80 to 120 kPa under heating, following which the vapor is fed to the semiconductor manufacturing apparatus.
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