发明名称 Chemically etched microcontact
摘要 <p>A method of fabricating a plurality of micro probes (81) comprising the steps of defining the shapes (72) of a plurality of probes (81) as a mask (73), applying a photoresist (1001) to a surface of a metal foil (1201), overlaying the mask (73) on the metal foil (1201), exposing the photoresist (1001) to light passed through the mask (73), developing the photoresist (1001), removing a portion of the photoresist (1001) to expose a portion (71) of the metal foil (1201), applying an etcher to the surface of the metal foil (1201) to remove the exposed portion to produce a plurality of probes (81), and chemically polishing and plating the plurality of probes (81). &lt;IMAGE&gt;</p>
申请公布号 EP1300685(A2) 申请公布日期 2003.04.09
申请号 EP20020020973 申请日期 2002.09.19
申请人 WENTWORTH LABORATORIES, INC. 发明人 MCQUADE,FRAN;BARTO, CHARLES, L.
分类号 G01R31/26;G01R1/067;G01R1/073;G01R3/00;H01L21/66;(IPC1-7):G01R3/00 主分类号 G01R31/26
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