UNEVEN LIGHT INTENSITY DISTRIBUTION INSPECTING APPARATUS AND UNEVEN LIGHT INTENSITY DISTRIBUTION INSPECTING METHOD

摘要

In the present invention, an image print mask 12H is photographed from a side across a light source 13 when the image print mask 12H for adjusting light so that a film is irradiated with the light is irradiated with the light, a luminance signal of the image print mask 12H is detected based on the photographed image on the image print mask 12H to create a luminance level waveform pattern 113A or 113B according to the luminance signal, and the luminance level waveform pattern 113A or 113B is displayed as the quantity-of-light unevenness of the light with which the image print mask 12H is irradiated, so that the luminance level waveform pattern 113A or 113Ba can make the user visually recognize the state of quantity-of-light unevenness of the light with which the image print mask 12H is irradiated.