发明名称 FINE POWDER FOR LAPPING PROCESSING
摘要 <p>PROBLEM TO BE SOLVED: To provide a fine powder for lapping processing capable of greatly improving surface accuracy of a work after the lapping processing and effectively suppressing the surface oblique edging caused by polishing. SOLUTION: This fine powder for the lapping processing comprises 40-70 wt.% of Al2 O3 , 20-40 wt.% of ZrO2 and 10-20 wt.% of SiO2 . D3% of the fine powder for lapping processing is 1.00-2.75μm. The fine powder for the lapping has <=1.0 distribution breadth represented by the following formula (1). Distribution breadth=(D3%-D94%)/D50% (1) (wherein, D3% denotes the particle diameter in which the integrated particle volume from the side of the large particle diameter corresponds to 3% of the whole particle volume; D94% denotes the particle diameter corresponding to 94% of the whole particle volume; and D50% denotes the particle diameter corresponding to 50% of the whole particle volume).</p>
申请公布号 JP2003105325(A) 申请公布日期 2003.04.09
申请号 JP20010298537 申请日期 2001.09.27
申请人 FUJIMI INC 发明人 SASAKI YASUMITSU
分类号 B24B37/00;C09K3/14;H01L21/304;(IPC1-7):C09K3/14 主分类号 B24B37/00
代理机构 代理人
主权项
地址