| 摘要 |
PROBLEM TO BE SOLVED: To smoothly remove a substrate, on which spacers are scattered, from a stage without disturbing the scattered state in the case of scattering the spacers to the substrate. SOLUTION: In the spacer scattering apparatus that scatters spacers onto the substrate 2 held by suction on the stage 1 in a chamber 4, when the scattered state of the spacers onto the substrate 2 is defective, a changeover device 8 selects a position of increasing the suction holding force exerted on the substrate 2 on the stage 1 and a cleaner 10 sucks and removes the spacers 3 on the substrate 2 strongly sucked. Since the suction holding force exerted to the substrate 2 in the stage 1 is increased only when the spacers 3 whose scattering state is defective are removed, the substrate 2 on which the spacers are normally scattered is held on the stage 1 with a smaller suction holding force. Thus, a vacuum destructive force exerted when the substrate 2 is removed is small, production of new static electricity is reduced and disturbance of the distribution of the spacers properly scattered can be avoided.
|
