发明名称 HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a high-quality heat-developable photosensitive material and a method for producing the same in which cissing and generation of black spots and streaks due to dust in a process atmosphere are not caused when an undercoat layer is formed on a support. SOLUTION: The heat-developable photosensitive material has an undercoat layer formed in an atmosphere having a cleanliness class of M5.45 or below and a silver behenate-containing photosensitive layer on a support. The method for producing the heat-developable photosensitive material comprises at least a first process in which a coating liquid for the undercoat layer is applied and dried on the support to form the undercoat layer and a second process in which a coating liquid for the silver behenate-containing photosensitive layer is applied and dried to form the photosensitive layer, wherein the undercoat layer formed in the first process is formed in an atmosphere having a cleanliness class of M5.45 or below.
申请公布号 JP2003107627(A) 申请公布日期 2003.04.09
申请号 JP20010294860 申请日期 2001.09.26
申请人 FUJI PHOTO FILM CO LTD 发明人 AZUMA SOICHIRO
分类号 G03C1/76;B05D1/38;B05D3/02;G03C1/498;G03C1/74;(IPC1-7):G03C1/76 主分类号 G03C1/76
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