发明名称 Positive photosensitive composition
摘要 <p>A positive photosensitive composition containing (A) an acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer.</p>
申请公布号 EP1300727(A2) 申请公布日期 2003.04.09
申请号 EP20020022234 申请日期 2002.10.02
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KODAMA, KUNIHIKO
分类号 G03F7/004;C08F20/18;C08F20/28;C08F32/00;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 主分类号 G03F7/004
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