| 摘要 |
<p>A method for inspecting multilayer masks to detect any defects includes illuminating a pixel region on a mask (6) to be inspected, using illuminating light (4) having a near peak wavelength that is close by patterns without defects to that of light reflected by the mask. The illuminating light specularly reflected by the mask is blocked. Scattered reflected illuminating light (7) is collected and used to form an enlarged image. An image detector (9) having a large plurality of pixels is used to observe the enlarged image to detect whether there are defects on the mask. The method is implemented using an mask inspection apparatus including a plasma light source (2) for generating radiant rays, an illuminating light collecting optical system (3) that collects radiated light from the light source for enlarged image formation illumination of a subject inspection region, a Schwarzschild optical system (8) including convex and concave mirrors for collecting scattered light (7) from the subject inspection region and forming an enlarged image of the inspection region, an image detector (9) having a large plurality of pixels for recording the enlarged image that is obtained, and an analyzer (11) that analyzes the images obtained to determine whether there is a defect. <IMAGE></p> |
