| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for manufacturing an array substrate of active elements, which can easily restore dot defects caused by the pattern deficit of a pixel electrode. SOLUTION: In the method for manufacturing the array substrate, a transparent conductive film 10 is formed on a transparent insulation substrate 1 on which a pixel electrode 8 is formed, and a resist pattern 11 having the same pattern as that of the pixel electrode 8 is formed on the transparent conductive film 10. Then, the array substrate is manufactured by performing the patterning of a transparent conductive film 13 having the same pattern as that of the pixel electrode 8 with the resist pattern 13 as a mask, ion-irradiating the transparent conductive film 10 and forming the transparent conductive pattern 13.</p> |
