MANUFACTURING METHOD FOR MICROLENS, MANUFACTURING METHOD FOR ARTICLE, WORKING METHOD FOR RESIST LAYER AND MICROLENS

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a microlens in a desired shape with a high resolution. SOLUTION: By exposing a resist layer 61 through a gray scale mask 50 having two or more stages of transmissivity distributions in a main plane direction and then developing it, the resist layer is worked into a three-dimensional shape corresponding to the desired microlens and a lens base material is etched with the resist layer as an etching mask. In an exposure process, the gray scale mask 50 is irradiated with a light of a predetermined wavelength, the light transmitted through the gray scale mask 50 is converged by a convergence optical system 102 and the resist layer 61 is irradiated with it. In the case of exposure, an upper surface of the resist layer 61 is defocused from a focus surface of the convergence optical system 102. A defocus amount is 10μm or more in the case of a front pin side and is 5μm or more in the case of a rear pin side.