发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR MANUFACTURING RESIST PATTERN AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in chemical resistance (plating resistance), adhesion property, mechanical strength and flexibility and to provide a photosensitive element, a method for manufacturing a resist pattern and a method for manufacturing a printed wiring board by using the above composition. SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerization initiator and (C) a photopolymerizable compound having at least one polymerizable ethylenic unsaturated group in the molecule. The (C) component contains a compound having at least one urethane bond in the molecule and a polyalkylene glycol di(meth)acrylate compound having at least two kinds of alkylene oxide groups in the molecule. The composition is used for the photosensitive element and for the method for manufacturing a resist pattern. The method for manufacturing a printed circuit board features that the substrate for the formation of circuits having a resist pattern produced by the above method for manufacturing a resist pattern is etched or plated. |
申请公布号 |
JP2003107695(A) |
申请公布日期 |
2003.04.09 |
申请号 |
JP20020234209 |
申请日期 |
2002.08.09 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
ICHIKAWA TATSUYA;ENDO MASAKI |
分类号 |
G03F7/027;C08F2/44;C08F299/02;H05K3/00 |
主分类号 |
G03F7/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|