PATTERN DEFECT INSPECTING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern defect inspecting device capable of simultaneously inspecting both of a chrome pattern and a phase shift pattern without detecting pseudo defect in a photomask in which the chrome pattern and the phase shift pattern coexist. SOLUTION: Based on the displacement quantity of both patterns to be obtained by measuring an alignment mark for a light shielding pattern and an alignment mark for the phase shift pattern, displacement quantity of pieces of design data of both patterns is compensated and pattern defect inspection of a pattern to be inspected is performed on the basis of a reference pattern obtained by compensation of the displacement quantity.