发明名称 DEVELOPING SLEEVE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a developing sleeve which is capable of inexpensively processing a multiplicity of sheets at a time and is capable of forming a surface layer having fine ruggedness provided with high reproducibility and high homogeneity under control and a method of manufacturing the same. SOLUTION: The outer peripheral surface 12a of the developing sleeve 12 is subjected to electroplating and the plating layer 14 formed on the outer peripheral surface 12 has ruggedness and the surface roughness Ra thereof is set at a range of 1 to 1/10 the grain size of a developer to be used. As the conditions for applying the electroplating, the plating stress of the plating layer 14 exists in a range from 9.8 to 68.6 N/mm<2> and a plating bath set with a current density at a range from 0.2 to 5 A/dm<2> is used. When a nickel-base bath like a nickel sulfamate bath or watt bath is used as the plating bath, the pH of a plating solution is set at a range from 2.5 to 4.5 and when a copper- base bath like a copper sulfate bath is used, the pH of the plating solution is set at a range from 1.0 to 4.0.
申请公布号 JP2003107897(A) 申请公布日期 2003.04.09
申请号 JP20010303402 申请日期 2001.09.28
申请人 INOAC CORP 发明人 NOMURA SHOICHI;YAMAMOTO TOSHIHIRO
分类号 G03G15/08;C25D3/12;C25D3/38;C25D7/00;F16C13/00;(IPC1-7):G03G15/08 主分类号 G03G15/08
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