发明名称 |
PROCESSING METHOD FOR PHOTOSENSITIVE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a processing method capable of performing a stable processing at all times not only in a tip area of a photosensitive material but also in an application area inside in application of a processing liquid to the photosensitive material. SOLUTION: In the processing method provided with a process of applying a developer to the photosensitive material having at least one photosensitive layer on a supporting body, an application amount of the developer is temporarily increased compared to a set application amount. |
申请公布号 |
JP2003107739(A) |
申请公布日期 |
2003.04.09 |
申请号 |
JP20010298428 |
申请日期 |
2001.09.27 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
TAKEI TAKANORI;HIRATA KENJI;FUJIOKA HAJIME |
分类号 |
G03F7/30;G03F7/00;G03F7/07;(IPC1-7):G03F7/30 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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