发明名称 PROCESSING METHOD FOR PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a processing method capable of performing a stable processing at all times not only in a tip area of a photosensitive material but also in an application area inside in application of a processing liquid to the photosensitive material. SOLUTION: In the processing method provided with a process of applying a developer to the photosensitive material having at least one photosensitive layer on a supporting body, an application amount of the developer is temporarily increased compared to a set application amount.
申请公布号 JP2003107739(A) 申请公布日期 2003.04.09
申请号 JP20010298428 申请日期 2001.09.27
申请人 MITSUBISHI PAPER MILLS LTD 发明人 TAKEI TAKANORI;HIRATA KENJI;FUJIOKA HAJIME
分类号 G03F7/30;G03F7/00;G03F7/07;(IPC1-7):G03F7/30 主分类号 G03F7/30
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