| 摘要 |
PROBLEM TO BE SOLVED: To obtain a microfabricated pattern provided with an excellent profile and satisfactory characteristics to be required, in a method for contracting the intervals of the photoresist pattern by disposing a water soluble resin coating on the photoresist pattern formed on a substrate surface and subsequently heat treating it, by preventing a solution residue from being caused in removing the water soluble resin coating after contraction treatment. SOLUTION: In microfabricating the resist pattern by contracting the intervals of the photoresist pattern by disposing the water soluble resin coating on the photoresist pattern formed on the substrate surface, subsequently heat treating it and thoroughly removing the water soluble resin, a water soluble polymer and a water soluble amine is introduced into the water soluble resin coating. |
