发明名称 |
EXPOSURE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To mitigate effect of non-parallel lights formed by being reflected inside a light control element in an exposure device performing parallel light exposure to a surface to be irradiated of an irradiation object by passing a light from a light source through a Fresnel lens. SOLUTION: In the exposure device performing the parallel light exposure to the surface to be irradiated of the irradiation object 5 by passing the light from the light source 1 through the Fresnel lens 2, the light control element 4 for cutting the non-parallel lights from the Fresnel lens 2 is provided between the surface to be irradiated of the irradiation object 5 and the Fresnel lens 2 and a mechanism for swinging the light control element 4 is provided further. By swinging the light control element 4, the effect of the non-parallel lights reflected inside the element is mitigated and the irradiation surface of the irradiation object is irradiated with the light of a more highly accurate illuminance distribution compared to the case of fixing the light control element.
|
申请公布号 |
JP2003107722(A) |
申请公布日期 |
2003.04.09 |
申请号 |
JP20010305933 |
申请日期 |
2001.10.02 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
HANDA SHINICHI;YAMASHITA YOHEI;KOBAYASHI MASARU;UCHIUMI TSUTOMU |
分类号 |
G03F7/20;G02B27/00;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|