发明名称 EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To mitigate effect of non-parallel lights formed by being reflected inside a light control element in an exposure device performing parallel light exposure to a surface to be irradiated of an irradiation object by passing a light from a light source through a Fresnel lens. SOLUTION: In the exposure device performing the parallel light exposure to the surface to be irradiated of the irradiation object 5 by passing the light from the light source 1 through the Fresnel lens 2, the light control element 4 for cutting the non-parallel lights from the Fresnel lens 2 is provided between the surface to be irradiated of the irradiation object 5 and the Fresnel lens 2 and a mechanism for swinging the light control element 4 is provided further. By swinging the light control element 4, the effect of the non-parallel lights reflected inside the element is mitigated and the irradiation surface of the irradiation object is irradiated with the light of a more highly accurate illuminance distribution compared to the case of fixing the light control element.
申请公布号 JP2003107722(A) 申请公布日期 2003.04.09
申请号 JP20010305933 申请日期 2001.10.02
申请人 DAINIPPON PRINTING CO LTD 发明人 HANDA SHINICHI;YAMASHITA YOHEI;KOBAYASHI MASARU;UCHIUMI TSUTOMU
分类号 G03F7/20;G02B27/00;(IPC1-7):G03F7/20 主分类号 G03F7/20
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