发明名称 TWO-DIMENSIONAL TO THREE-DIMENSIONAL VLSI DESIGN
摘要 An apparatus and a method for producing a mask, which was derived using two-dimensional design tools, for imparting circuit designs directly on a three-dimensional surface. The method for creating the mask includes the steps of creating a two dimensional design with at least one element, establishing a location coordinate for the element using a two-dimensional coordinate system, converting the location coordinate for the element into a spacial coordinate for the element using a three-dimensional spacial coordinate system, converting the spacial coordinate for the element into a positional coordinate, and generating the mask using the positional coordinate. The apparatus for implementing three-dimensional designs using a mask, which is generated from a two-dimensional design, includes a light source and an elliptical mirror. The elliptical mirror has two focal points so that the elliptical mirror can focus a beam of light onto the three-dimensional surface.
申请公布号 EP1095346(A4) 申请公布日期 2003.04.09
申请号 EP19990931925 申请日期 1999.06.24
申请人 BALL SEMICONDUCTOR INC. 发明人 RAMAMURTHI, RAM, K.;TAKEDA, NOBOU
分类号 G03F1/00;G03F7/24;G06F17/50;H01L21/027;H01L29/06 主分类号 G03F1/00
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