| 发明名称 |
PLASMA PROCESSING DEVICE |
| 摘要 |
<p>In a microwave plasma processing apparatus that uses a radial line slot antenna, the efficiency of cooling of a shower plate is optimized and simultaneously the efficiency of microwave excitation is optimized, by causing a radiation surface of the radial line slot antenna to make an intimate contact with a cover plate that forms a part of an outer wall of the processing chamber and makes an intimate contact with the shower plate. <IMAGE></p> |
| 申请公布号 |
EP1300877(A1) |
申请公布日期 |
2003.04.09 |
| 申请号 |
EP20020708712 |
申请日期 |
2002.03.28 |
| 申请人 |
OHMI, TADAHIRO;TOKYO ELECTRON LIMITED |
发明人 |
OHMI, TADAHIRO;HIRAYAMA, MASAKI;SUGAWA, S;GOTO, TETSUYA |
| 分类号 |
H05H1/46;B01J19/08;C23C16/50;C23C16/511;C30B25/10;H01J37/32;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/31;H01L21/306 |
主分类号 |
H05H1/46 |
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