METHOD OF MANUFACTURING MASK PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method of manufacturing mask pattern and a method for manufacturing a semiconductor device are provided to be capable of reducing the calculation time of a correction value group and decreasing the time used for a mask pattern correcting process. CONSTITUTION: A correction library editing tool(200) is provided with a correction value group calculating part(201) and a correction value re-writing part(202). At this time, the correction value group calculating part has the same function as a correction value group calculating part of a mask pattern manufacturing apparatus. When a correction parameter(114) is inputted to the correction library editing tool, the correction value group calculating part sequentially reads edge coordinate groups from a correction library(112) and outputs each correction value group for each edge coordinate group.