发明名称 Silicon nitride film comprising amorphous silicon quantum dots embedded therein, its fabrication method and light-emitting device using the same
摘要 The present invention relates to a light-emitting device utilizing amorphous silicon quantum dot nanostructures, wherein the light-emitting device can be fabricated using the existing silicon semiconductor fabrication technology, is excellent in light-emitting efficiency, and can emit light in the visible region including short wavelength region such as green and blue.
申请公布号 US6544870(B2) 申请公布日期 2003.04.08
申请号 US20010836175 申请日期 2001.04.18
申请人 KWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 PARK NAE MAN;KIM TAE SOO;PARK SEONG JU
分类号 H01L31/0352;H01L33/06;H01L33/34;(IPC1-7):H01L21/36 主分类号 H01L31/0352
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