发明名称 |
Silicon nitride film comprising amorphous silicon quantum dots embedded therein, its fabrication method and light-emitting device using the same |
摘要 |
The present invention relates to a light-emitting device utilizing amorphous silicon quantum dot nanostructures, wherein the light-emitting device can be fabricated using the existing silicon semiconductor fabrication technology, is excellent in light-emitting efficiency, and can emit light in the visible region including short wavelength region such as green and blue.
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申请公布号 |
US6544870(B2) |
申请公布日期 |
2003.04.08 |
申请号 |
US20010836175 |
申请日期 |
2001.04.18 |
申请人 |
KWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
PARK NAE MAN;KIM TAE SOO;PARK SEONG JU |
分类号 |
H01L31/0352;H01L33/06;H01L33/34;(IPC1-7):H01L21/36 |
主分类号 |
H01L31/0352 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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