发明名称 |
ABRASIVE SILICA PARTICLE-DISPERSED FLUID, ITS MANUFACTURING METHOD, AND ABRASIVE MATERIAL |
摘要 |
PURPOSE: To provide an abrasive silica particle-dispersed fluid which is low in Na ion content and contains ions which are specified in a range of content, excluding Na ions. CONSTITUTION: An abrasive silica particle-dispersed fluid contains silica particles having an average grain diameter of 5 to 300 nm and dispersed into it, the Na ion content of the silica particle-dispersed fluid is 100 ppm or below, and the other ion content ranges from 300 ppm to 2 wt.%. If the Na ion content exceeds 100 ppm, Na is left on a polished substrate when the silica particle- dispersed fluid is used as an abrasive material, so that Na left on the semiconductor substrate causes an insulating failure or a short circuit to a circuit formed on the semiconductor substrate. |
申请公布号 |
KR20030028419(A) |
申请公布日期 |
2003.04.08 |
申请号 |
KR20020059266 |
申请日期 |
2002.09.30 |
申请人 |
CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. |
发明人 |
NISHIDA HIROYASU;WAKAMIYA YOSHINORI;WATANABE MANABU;KOMATSU MICHIO |
分类号 |
B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/3105;H01L21/321;(IPC1-7):C09K3/14 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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