发明名称 Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices
摘要 The present invention relates to a method and system of inspecting a product, including extracting defects from the product, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data of the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects for inspection. The method and system is characterized in that the extracted feature data of the defects is fed back for inspecting the product. The present invention also relates to a method of manufacturing a semiconductor electric or electronic device, including extracting defects from the semiconductor electric or electronic device, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data on the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects to an apparatus for manufacturing the semiconductor electric or electronic device.
申请公布号 US6546308(B2) 申请公布日期 2003.04.08
申请号 US20010812822 申请日期 2001.03.21
申请人 HITACHI, LTD, 发明人 TAKAGI YUJI;DOI HIDEAKI;ONO MAKOTO
分类号 G01N21/94;(IPC1-7):G06F19/00 主分类号 G01N21/94
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