| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method capable of carrying out polishing without causing a scratch to an object to be polished. SOLUTION: A polishing liquid 3 without abrasive grains is fed between polishing tools 4 and 5 and the object 2 to be polished. Chemical polishing is carried out while relatively moving the polishing tools 4 and 5 and the object 2 to be polished. A diammonium cerium nitrate (VI) solution is used as the polishing liquid 3. Since cerium is an ion in the diammonium cerium nitrate (VI) solution and it does not contact the object 2 to be polished in a form of an abrasive grain, there will be no scratches on a surface of the object 2 to be polished.</p> |
