发明名称 TRANSFER MECHANISM FOR QUADRILATERAL SUBSTRATE AND POLISHING DEVICE FOR QUADRILATERAL SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a transfer mechanism capable of transferring a quadrilateral substrate and a polishing device capable of polishing the quadrilateral substrate. SOLUTION: The transfer mechanism for the quadrilateral substrate transferring the quadrilateral substrate has a substrate pedestal 107 receiving the substrate W and a horizontally sliding second positioning pin 112 composed so as to position the substrate W mounted on the substrate pedestal 107 to the transfer mechanism. The polishing device for the quadrilateral substrate is provided with a polishing head 21 composed so as to hold the substrate W for polishing it, a pusher 101 used as a transfer mechanism composed so as to press the substrate W for holding it against the polishing head, and a first positioning pin 111 provided on the pusher 101 or the polishing head 21 with an axis directed in a pressing direction of the pusher 101 and composed so as to carry out relative positioning between the pusher 101 and the polishing head 21.
申请公布号 JP2003103458(A) 申请公布日期 2003.04.08
申请号 JP20010300348 申请日期 2001.09.28
申请人 EBARA CORP 发明人 TORII HIROOMI;AIZAWA HIDEO;KOJIMA HIROSHI
分类号 B23Q3/18;B24B37/04;B24B37/30;B24B41/06;H01L21/68 主分类号 B23Q3/18
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