发明名称 |
TRANSFER MECHANISM FOR QUADRILATERAL SUBSTRATE AND POLISHING DEVICE FOR QUADRILATERAL SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a transfer mechanism capable of transferring a quadrilateral substrate and a polishing device capable of polishing the quadrilateral substrate. SOLUTION: The transfer mechanism for the quadrilateral substrate transferring the quadrilateral substrate has a substrate pedestal 107 receiving the substrate W and a horizontally sliding second positioning pin 112 composed so as to position the substrate W mounted on the substrate pedestal 107 to the transfer mechanism. The polishing device for the quadrilateral substrate is provided with a polishing head 21 composed so as to hold the substrate W for polishing it, a pusher 101 used as a transfer mechanism composed so as to press the substrate W for holding it against the polishing head, and a first positioning pin 111 provided on the pusher 101 or the polishing head 21 with an axis directed in a pressing direction of the pusher 101 and composed so as to carry out relative positioning between the pusher 101 and the polishing head 21. |
申请公布号 |
JP2003103458(A) |
申请公布日期 |
2003.04.08 |
申请号 |
JP20010300348 |
申请日期 |
2001.09.28 |
申请人 |
EBARA CORP |
发明人 |
TORII HIROOMI;AIZAWA HIDEO;KOJIMA HIROSHI |
分类号 |
B23Q3/18;B24B37/04;B24B37/30;B24B41/06;H01L21/68 |
主分类号 |
B23Q3/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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