发明名称 |
Particle distribution method and resulting structure for a layer transfer process |
摘要 |
A method of forming substrates. The method includes providing a donor substrate; and forming a particle accumulation region at a selected depth in the donor substrate. The method includes diffusing a plurality of particles into the particle accumulation region to add stress to the particle accumulation region; and separating a thickness of material above the selected depth in the donor substrate.
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申请公布号 |
US6544862(B1) |
申请公布日期 |
2003.04.08 |
申请号 |
US20000484383 |
申请日期 |
2000.01.14 |
申请人 |
SILICON GENESIS CORPORATION |
发明人 |
BRYAN MICHAEL A. |
分类号 |
H01L21/30;H01L21/46;H01L21/762;(IPC1-7):H01L21/30 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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