发明名称 Particle distribution method and resulting structure for a layer transfer process
摘要 A method of forming substrates. The method includes providing a donor substrate; and forming a particle accumulation region at a selected depth in the donor substrate. The method includes diffusing a plurality of particles into the particle accumulation region to add stress to the particle accumulation region; and separating a thickness of material above the selected depth in the donor substrate.
申请公布号 US6544862(B1) 申请公布日期 2003.04.08
申请号 US20000484383 申请日期 2000.01.14
申请人 SILICON GENESIS CORPORATION 发明人 BRYAN MICHAEL A.
分类号 H01L21/30;H01L21/46;H01L21/762;(IPC1-7):H01L21/30 主分类号 H01L21/30
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