| 摘要 |
PURPOSE: An apparatus for outputting a plasma source for an array-type high quality process and correcting uniformity of the plasma source is provided to improve uniformity of plasma density in a large area, by individually controlling inductance of each unit antenna so that radio frequency(RF) power is uniformly distributed to each source. CONSTITUTION: A variable inductance switch(3) is attached to an antenna coil(5), capable of rotating. A control bar(4) changes the path of RF current and varies inductance according to the rotation of the variable inductance switch, attached to the variable inductance switch. An antenna switch(6) directly controls the inductance.
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