发明名称 RESIN COMPOSITION
摘要 PURPOSE: To provide a new resin composition and its cured product containing a polycarboxylic acid resin, further to provide a photosensitive resin composition in which high resolution can be obtained, and particularly, to provide a color photosensitive resin composition in which high resolution can be obtained even when a pigment having a small particle size is used in high concentration. CONSTITUTION: The resin composition contains a polycarboxylic acid resin obtained by preparing a reaction product of (a) an epoxy compound having at least two or more epoxy groups in the molecule with (b) a monocarboxylic acid having no reactive double bond and further reacting (c) a polybasic carboxylic acid or its anhydride with the above reaction product.
申请公布号 KR20030027719(A) 申请公布日期 2003.04.07
申请号 KR20020058046 申请日期 2002.09.25
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 NAKAI HIDEYUKI;MURO SEIJI
分类号 G03F7/032;C08F2/44;C08F283/10;C08L63/10;G02B5/20 主分类号 G03F7/032
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