WAFER CLEANING APPARATUS OF SEMICONDUCTOR FABRICATING EQUIPMENT

摘要

PURPOSE: A wafer cleaning apparatus of semiconductor fabricating equipment is provided to improve process efficiency and easily distinguish the front surface of a transferred wafer from the back surface of the wafer by making a wafer backside cleaning apparatus have a wafer inversion unit in the same chamber. CONSTITUTION: A wafer cassette(110) having wafers is placed in an index(100). A transfer unit(120) loads/unloads the wafers of the wafer cassette. The wafer backside cleaning apparatus(200) performs a rear surface cleaning process on the wafer supplied from the transfer unit, installed inside a process chamber(130). A rotation unit supports and rotates the wafer. A cleaning unit cleans the rear surface of the wafer, positioned adjacent to the rotation unit. The wafer inversion unit inverts the wafer to perform the rear surface cleaning process. The wafer backside cleaning apparatus includes the rotation unit, the cleaning unit and the wafer inversion unit.