发明名称 METHOD FOR ELIMINATING PLATING LAYER ON LEADFRAME
摘要 PURPOSE: A method for eliminating a plating layer on a leadframe is provided to recycle the leadframe while using a conventional rework apparatus by eliminating a plating layer composed of a material like a tin-bismuth alloy whose critical point between over-etching and non-etching is difficult to determine. CONSTITUTION: A leadframe having the plating layer is dipped into chemical liquid including acid and additive(120). The leadframe from which the plating layer is removed is rinsed(130). The rinsed leadframe is dried(140). The leadframe is cleaned with ultrasonic(150). The leadframe is dried(160). The leadframe from which the plating layer is eliminated is inspected(170).
申请公布号 KR20030027414(A) 申请公布日期 2003.04.07
申请号 KR20010060642 申请日期 2001.09.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HAN, JANG WON;KIM, DONG GUK;KIM, NAM SEOK
分类号 H01L23/50;(IPC1-7):H01L23/50 主分类号 H01L23/50
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