CONTAMINATION PREVENTING APPARATUS IN WAFER EDGE EXPOSURE SYSTEM

摘要

PURPOSE: A contamination preventing apparatus in wafer edge exposure system is provided to increase the lifetime of a lamp filter by minimizing or preventing contamination of the lamp filter. CONSTITUTION: A lamp(90) and the lamp filter(60) are prepared. An air flow part(200) makes the heat of the lamp applied to the lamp filter flow downward, located in a position over the lamp filter installed inside a lamp house(10). The air flow part has a plurality of air nozzles(220) installed along both surfaces of the lamp filter in parallel to flow air to both surfaces of the lamp filter.