SUBSTRATE TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment device that performs slit scan development for the substrate and then sufficiently cleans the substrate after a developing stopper is supplied. SOLUTION: A developing solution supply nozzle 21 supplies a developing solution to a main surface of a substrate W while traveling from one end to the other end of the substrate W. After a specified time period, a developing stopper supply nozzle 31 having a slit-shape outlet travels above the main surface in the same direction and at the same rate as the nozzle 21, and supplies a rinsing liquid as the stopper. After this process, a cleaning liquid supply nozzle 41 travels above the main surface, and supplies a rinsing liquid which is the cleaning liquid to the main surface of the substrate W.