| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment system with a superior throughput. SOLUTION: In the substrate treatment system 1, a coating module 10, an exposure unit 20, a development module 30 are sequentially arranged. When a series of treatment processes, such as resist coating, exposure, development processes, is carried out for the substrate, the carriage of the substrate is in one direction, so that the throughput can be improved. |
