| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposing method in a charged particle beam exposure device capable of reducing the changing amounts of blur in one exposing region. SOLUTION: Blur M at an optical axis position is monotonously increased according as a focal scanning range is increased, and blur N at the edge of a sub-field is not changed so much when the focal scanning range is small, and rapidly increased when the focal scanning range exceeds a certain point. Therefore,Δblur (indicated by P) being a difference between the blur in the sub-field is monotonously decreased according as the focal scanning range is increased. Therefore, the focal position is changed in one shot exposure in a range where the maximum blur is turned to be an allowable range in the sub-field so that theΔblur can be decreased, and that the uniformity of the blur in the sub-field can be increased.
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