发明名称 SUBSTRATE TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment system in which a substrate can be inspected in a short time. SOLUTION: The substrate treatment system comprises a section where a unit performing a specified treatment of a substrate is disposed, and an indexer ID. The indexer ID is equipped with a transfer robot TF for mounting a carrier capable of containing a plurality of substrates and delivering a not yet treated substrate in the carrier C to the section where the unit is disposed and containing a treated substrate received therefrom in the carrier C. Since an inspection unit 10 is disposed in the carriable region of the transfer robot TF on the side part of the indexer ID, the substrate can be inspected in a short time. Even if the inspection unit 10 is disposed to project from the substrate treatment system, clean air can be supplied from an air supply section 90 to the inspection unit 10 and thereby the substrate can be inspected in a clean atmosphere.
申请公布号 JP2003100836(A) 申请公布日期 2003.04.04
申请号 JP20010287237 申请日期 2001.09.20
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NISHIMURA JOICHI;OTANI MASAMI;HAJIKI KENJI;SHIGA MASAYOSHI
分类号 G03F7/26;H01L21/027;H01L21/66;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 G03F7/26
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