发明名称 WITHSTAND VOLTAGE INSPECTION METHOD AND APPARATUS THEREOF
摘要 PROBLEM TO BE SOLVED: To improve inspection efficiency by increasing the insulation capability among electrodes in the withstand voltage inspection of a high-withstand voltage device and the apparatus cases of a high-voltage generator or the like, and by enabling the withstand voltage inspection in a state of a semiconductor substrate. SOLUTION: A semiconductor wafer 1 is dipped into an insulating solution 22, thus enabling a withstand voltage inspection in a state where insulating resistance is improved among a probe 11P connected to a gate, a 12P connected to an emitter and an electrode 13C connected to a collector, and a container 21. Inspection in the state of a semiconductor wafer 1 can be made, thus increasing inspection efficiency and productivity efficiency.
申请公布号 JP2003100819(A) 申请公布日期 2003.04.04
申请号 JP20010294329 申请日期 2001.09.26
申请人 TOSHIBA CORP 发明人 HIYOSHI MICHIAKI
分类号 G01R31/26;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01R31/26
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