SUBSTRATE DEVELOPING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate developing device capable of improving the activity ratio of the device at relatively low costs by determining the propriety/ impropriety of a pattern dimension based on reflected light. SOLUTION: An optical head 13 and a data processing part 41 built in a substrate developing device measure a pattern dimension based on reflected light in order to determine the propriety/impropriety of the pattern dimension. When it is determined that the pattern dimension is improper, a display device 37 issues warning so that it is possible to determine whether or not the development processing has been properly carried out without moving the substrate to a measuring device in order to measure the pattern dimension, and that it is possible to reduce costs by not using any SEM. Therefore, it is possible to improve the activity ratio of the device, and to obtain the device at relatively low costs.