RESIST REMOVING COMPOSITION AND METHOD FOR REMOVING RESIST USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a resist removing composition excellent in power to remove not only a resist but also an etching by-product such as a polymer, causing no damage to a film under the resist and having such a moderate viscosity as not to leave residua and residue after rinsing with deionized water. SOLUTION: The resist removing composition comprises an alkoxy N- hydroxyalkylalkaneamide, a swelling agent and, optionally, one or more compounds selected from the group comprising polar materials having a dipole moment of >=3, damage preventers and alkanolamines.