发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus which can keep consistent viscosity of a SOG chemical and which can be used for a long term. SOLUTION: The semiconductor manufacturing apparatus has a portion to preserve a solid component of the chemical, a portion to preserve solvent and a SOG-coating apparatus with a portion for mixing the solid component and the solvent at a certain ratio.
申请公布号 JP2003100729(A) 申请公布日期 2003.04.04
申请号 JP20010293665 申请日期 2001.09.26
申请人 SEIKO INSTRUMENTS INC 发明人 KAMIMURA KEISUKE
分类号 H01L21/768;H01L21/31;(IPC1-7):H01L21/31 主分类号 H01L21/768
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