| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem about the fact that it is hard to accurately detect the transitional state of etching due to a resist film when etching is carried out through a window bored in the resist film, and expensive equipment is required. SOLUTION: Fine open windows 3b are arranged adjacent to one another on a resist film 3 covering a substrate 1, and etching of the substrate 1 is controlled on the basis of its etching state indicated through the resist film 3 between the fine open windows 3b.
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