发明名称 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND DEFECT INSPECTING DATA PROCESSING METHOD AND SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a semiconductor device and a defect inspecting data processing method and its system in which a process or a producing device causing defects are rapidly estimated or determined so that a countermeasure is provided to realize a stable and high yield in a production line of the semiconductor device. SOLUTION: The similarity of the inspected result of a wafer which is inspected in the past to the distribution of defects of the water in which defects are abnormally generated is quantitatively evaluated. The periodicity of the data line of the obtained similarity is analyzed. The relation between the analyzation result and the starting method of each producing device is evaluated to estimate or determine the process and the device for generating the defects.
申请公布号 JP2003100825(A) 申请公布日期 2003.04.04
申请号 JP20010287779 申请日期 2001.09.20
申请人 HITACHI LTD 发明人 TANAKA MAKI;MAEDA SHUNJI;NOGUCHI MINORU;OKABE TAKASHI;TAKAGI YUJI;SHISHIDO CHIE
分类号 H01L21/00;H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/00
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