RESIN FOR PHOTORESIST AND PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a high sensitivity and high resolution resin for a photoresist having improved transparency and a photoresist composition. SOLUTION: The resin for a photoresist is obtained by substituting groups releasable by the action of an acid for part or all of hydroxyl groups in a resin obtained by reacting m-cresol with formaldehyde in the presence of an acid catalyst. The photoresist composition contains a photo-acid generator in the resin for a photoresist.