| 摘要 |
PROBLEM TO BE SOLVED: To provide a solution processing apparatus and a processing method with which a substrate, even when it is large in size, can be processed uniformly at the entire part thereof without increase of its foot print. SOLUTION: The developing process unit (DEV) 24 comprises a roller transferring mechanism 14 for transferring an LCD substrate G in a single direction almost in the horizontal attitude, a main developer discharge nozzle 51a and a sub developer discharge nozzle 51b for discharging the developer to the LCD substrate G, and a nozzle moving mechanism 60a for scanning the main and sub developer discharge nozzles 51a, 51b over the LCD substrate G. While the main and sub developer discharge nozzles 51a, 51b are scanned over the LCD substrate G by driving the nozzle moving mechanism 60a, these developer discharge nozzles 51a, 51b discharge the developer to the LCD substrate G. Accordingly, uniform developing process can be performed at the entire part of the LCD substrate G by shortening the supply period of the developer. |
