发明名称 CHARGED PARTICLE BEAM DEVICE AND METHODS FOR PATTERN MEASURING AND PATTERN DRAWING
摘要 PROBLEM TO BE SOLVED: To stably eliminate image distortion including magnification error at all times regardless of structures of samples. SOLUTION: The charged particle beam device 1 comprises a charged particle beam generator 10, a condenser lens 12, a deflector 14 and an objective lens 16. In this device, a focus position detecting part 28 which adjusts the current supplied to the objective lens 16 and outputs focus controlling current I1 of the objective lens 16 when the charged particle beam EB focuses on the surface of a sample 20, a height detector 51 which detects the height of the sample surface, a focus controlling signal calculating part 24 which calculates the controlling current I0 of the objective lens 16 in accordance with detected height of the sample 20, a focus controlling signal difference calculating part 32 which calculates the difference of controlling currentsΔI (I1 -I0 ), a magnification variation calculating part 34 which calculates the magnification variationΔMag of charged particle beam EB in accordance with the differenceΔI, and a deflection controlling part 36 which generates deflection controlling signal for correcting the controlling signal toward the deflector 14 in accordance with the variationΔMag, are equipped.
申请公布号 JP2003100246(A) 申请公布日期 2003.04.04
申请号 JP20010291223 申请日期 2001.09.25
申请人 TOSHIBA CORP 发明人 ABE HIDEAKI
分类号 F02M37/08;F02M37/10;G01B15/00;G01J1/00;G01N21/00;G01N23/225;G01Q30/06;G03F7/20;H01J37/00;H01J37/147;H01J37/153;H01J37/21;H01J37/28;H01J37/317;H01L21/027;H01L21/66;(IPC1-7):H01J37/21 主分类号 F02M37/08
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