发明名称 MASK AND ITS MANUFACTURING METHOD, ELECTROLUMINESCENCE EQUIPMENT AND ITS MANUFACTURING METHOD AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a mask and its manufacturing method, EL equipment and its manufacturing method, and an electric device, in which effective cooling is possible. SOLUTION: The manufacturing method of the mask includes attaching a 2nd substrate 20, in which two or more penetration holes 22 have been formed in a 1st substrate 10, in which the opening 12 has been formed. The 2nd substrate 20 is attached so that the two or more penetration holes 22 may be located inside the opening 12. A slot 14 is formed in the face, which counters the 2nd substrate 20 in the 1st substrate 10. The slot 14 forms a flow way between the 1st and 2nd substrates 10 and 20.
申请公布号 JP2003100453(A) 申请公布日期 2003.04.04
申请号 JP20010292041 申请日期 2001.09.25
申请人 SEIKO EPSON CORP 发明人 YOTSUYA SHINICHI
分类号 H05B33/10;C23C14/04;H01L51/50;H01L51/56;H05B33/12;(IPC1-7):H05B33/10;H05B33/14 主分类号 H05B33/10
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