| 摘要 |
PROBLEM TO BE SOLVED: To provide a small wave front aberration measurement apparatus that can be easily mounted on an exposure system and can quickly and highly accurately measure aberration in an optical system to be inspected, and the exposure system and a device manufacturing method that can improve exposure accuracy and highly accurately and productively manufacture a device. SOLUTION: A light-receiving optical system for a first, a second, and a third relay lens 143, 145, 146 converting light EL for exposure passing through a projection optical system to parallel light is housed in a light receiving enclosure 137. A micro lens array (MLA) 150 dividing the light EL for the exposure to a plurality of a luminous fluxes at its pupil surface PS and an image pickup device 153 detecting a light condensing position FP of each split flux are housed in a detecting enclosure 138. The MLA 150 is constructed that a plurality of micro lens elements are one dimensionally arranged in a direction intersectionally to its scanning direction and the light receiving enclosure 137 and the detecting enclosure 138 are individually mounted on a second wafer stage WS2 and a first wafer stage WS1 and then the whole of the pupil surface PS is scanned with the MLA 150.
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