| 摘要 |
PROBLEM TO BE SOLVED: To provide a wiring pattern having a substantially identical wiring width by using a super resolution technology able to realize a fine pattern beyond the resolution of an exposure apparatus by combining process technologies without raising the resolution limit of the exposure apparatus. SOLUTION: A method for manufacturing a wiring pattern in which wiring layers having a substantially identical width are juxtaposed with substantially identical intervals, comprising a step for forming a chemical amplification resist layer on the wiring material layer and a mask forming process for forming a plurality of resist masks juxtaposed with substantially identical intervals and having a substantially identical width by patterning the chemical amplification resist layer, wherein the mask forming process further includes a process for forming sacrificial resist masks, which are juxtaposed to the resist mask with intervals substantially identical to those of the resist mask outside of the plurality of resist masks. |
