发明名称 MASK AND ITS MANUFACTURING METHOD, ELECTROLUMINESCENCE EQUIPMENT AND ITS MANUFACTURING METHOD AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a mask with large intensity and its manufacturing method, EL equipment and its manufacturing method and an electric device. SOLUTION: The manufacture method of a mask includes attaching a 2nd substrate 20, in which two or more penetrating holes 22 have been formed in a 1st substrate 10, in which an opening 12 has been formed. The two or more penetrating holes 22 are arranged inside the opening 12. The 1st and 2nd substrates 10 and 20 can be joined by positive electrode junction. The 1st and 2nd substrates 10 and 20 can be positioned and attached by the 1st and 2nd alignment marks 14 and 24.
申请公布号 JP2003100460(A) 申请公布日期 2003.04.04
申请号 JP20010292040 申请日期 2001.09.25
申请人 SEIKO EPSON CORP 发明人 YOTSUYA SHINICHI
分类号 H01L51/50;C23C14/04;G03F7/12;H05B33/10;H05B33/12;(IPC1-7):H05B33/14 主分类号 H01L51/50
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